Revert "SW mask gen: release scratch bitmap after upload"
This reverts commit 49e5b3a339ed18e7bdd7ff8dd4e852d51f051775.
Reason for revert: Going back to deferred proxies
Original change's description:
> SW mask gen: release scratch bitmap after upload
>
> This fixes a regression introduced in 366716, where we
> were retaining the scratch bitmap. Before that change we were
> destroying it after upload which is what we should do.
>
> Bug: skia:11288
> Change-Id: Ib567be037a2ff7595cd305a2ef3502d336795c46
> Reviewed-on: https://skia-review.googlesource.com/c/skia/+/367880
> Reviewed-by: Greg Daniel <egdaniel@google.com>
> Commit-Queue: Adlai Holler <adlai@google.com>
TBR=egdaniel@google.com,robertphillips@google.com,adlai@google.com
Change-Id: I454622563ad899691fa55cd99853261e2ce66086
No-Presubmit: true
No-Tree-Checks: true
No-Try: true
Bug: skia:11288
Reviewed-on: https://skia-review.googlesource.com/c/skia/+/368253
Reviewed-by: Adlai Holler <adlai@google.com>
Commit-Queue: Adlai Holler <adlai@google.com>
1 file changed